Roughness and chemistry of silicon and polysilicon surfaces etched in high-density plasma: XPS, AFM and ellipsometry analysis
- 1 September 2000
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 164 (1-4) , 147-155
- https://doi.org/10.1016/s0169-4332(00)00334-2
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
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