Density and deposition rates of amorphous CVD-Si3N4 including carbon
- 1 October 1981
- journal article
- research article
- Published by Springer Nature in Journal of Materials Science
- Vol. 16 (10) , 2877-2882
- https://doi.org/10.1007/bf02402853
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Preparation of amorphous Si3N4-C plate by chemical vapour depositionJournal of Materials Science, 1981
- Preparation of Si3N4 by Chemical Vapor Deposition (Effects of Raw Gas Flow Rate)Journal of the Japan Institute of Metals and Materials, 1977
- Chemical vapour-deposited silicon nitrideJournal of Materials Science, 1976
- Chemical vapor deposition in the systems silicon-carbon and silicon-carbon-nitrogenJournal of the Less Common Metals, 1974
- Synthesis, Characterization, and Consolidation of Si3N4 Obtained from Ammonolysis of SiCl4Journal of the American Ceramic Society, 1973
- The Preparation and Properties of Amorphous Silicon Nitride FilmsJournal of the Electrochemical Society, 1967
- Some interesting properties of pyrolytic carbonJournal of the Less Common Metals, 1959