The microstructure of reactively sputtered Ti-N films containing the Ti2N phase
- 31 May 1985
- journal article
- Published by Elsevier in Acta Metallurgica
- Vol. 33 (5) , 797-803
- https://doi.org/10.1016/0001-6160(85)90103-8
Abstract
No abstract availableKeywords
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