Synthesis of titanium nitrides by activated reactive evaporation
- 1 October 1980
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 72 (3) , 529-533
- https://doi.org/10.1016/0040-6090(80)90543-x
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Microstructures of TiN and Ti2N deposits prepared by activated reactive evaporationThin Solid Films, 1979
- High rate deposition of hafnium nitride by activated reactive evaporation (ARE)Thin Solid Films, 1979
- Physical vapor deposition of chromium and titanium nitrides by the hollow cathode discharge processThin Solid Films, 1978
- Hard decorative TiN coatings by ion platingThin Solid Films, 1977
- Applications of wear-resistant thick films formed by physical vapor deposition processesThin Solid Films, 1977
- The Effect of Substrate Temperature on the Structure of Titanium Carbide Deposited by Activated Reactive EvaporationJournal of Vacuum Science and Technology, 1972