Ellipsometry applied to films on dielectric substrates
- 31 August 1969
- journal article
- Published by Elsevier in Surface Science
- Vol. 16, 288-302
- https://doi.org/10.1016/0039-6028(69)90025-9
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
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- Determining Optical Constants of Metals by Reflection of Elliptically Polarized Light*†Journal of the Optical Society of America, 1964
- Measurement of the thickness and refractive index of very thin films and the optical properties of surfaces by ellipsometryJournal of Research of the National Bureau of Standards Section A: Physics and Chemistry, 1963
- Determination of the Properties of Films on Silicon by the Method of EllipsometryJournal of the Optical Society of America, 1962
- Polarimetric Methods for the Determination of the Refractive Index and the Thickness of Thin Films on GlassJournal of the Optical Society of America, 1947
- LVIII. On apparatus for the production of circularly polarized lightJournal of Computers in Education, 1911