SIMOX — a new challenge for ion implantation
- 1 March 1995
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 96 (1-2) , 420-424
- https://doi.org/10.1016/0168-583x(94)00532-x
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- SIMOX wafers with low dislocation density produced by a 100-mA-class high-current oxygen implanterNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1991