Influence of manufacturing process of indium tin oxide sputtering targets on sputtering behavior
- 1 November 1992
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 220 (1-2) , 333-336
- https://doi.org/10.1016/0040-6090(92)90594-2
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Indium tin oxide thin films prepared by chemical vapour depositionThin Solid Films, 1991
- High Conducting Large Area Indium Tin Oxide Electrodes for Displays Prepared by DC Magnetron SputteringJapanese Journal of Applied Physics, 1991
- Indium-tin oxide deposition by d.c. reactive sputtering on a low softening point materialThin Solid Films, 1990
- Low resistivity indium–tin oxide transparent conductive films. II. Effect of sputtering voltage on electrical property of filmsJournal of Vacuum Science & Technology A, 1990
- Highly Conductive and Transparent Aluminum Doped Zinc Oxide Thin Films Prepared by RF Magnetron SputteringJapanese Journal of Applied Physics, 1984
- Preparation and properties of reactively co-sputtered transparent conducting filmsThin Solid Films, 1975
- Highly Conductive, Transparent Films of Sputtered In[sub 2−x]Sn[sub x]O[sub 3−y]Journal of the Electrochemical Society, 1972