Indium tin oxide thin films prepared by chemical vapour deposition
- 1 August 1991
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 203 (2) , 297-302
- https://doi.org/10.1016/0040-6090(91)90137-m
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Fluorine-Doped Indium Oxide Thin Films Prepared by Chemical Vapor DepositionJapanese Journal of Applied Physics, 1990
- Indium-Tin Oxide Thin Films Prepared by Chemical Vapor Deposition from Metal AcetatesJapanese Journal of Applied Physics, 1990
- Indium-Tin Oxide Thin Films Prepared by Thermal Decomposition of Metallic Complex SaltsJapanese Journal of Applied Physics, 1988
- Transparent conductive films of In2O3:Sn prepared by the pyrolysis methodThin Solid Films, 1982
- Chemical vapor deposition of transparent electrically conducting layers of indium oxide doped with tinThin Solid Films, 1975