Gallium-related defect centers in molecular-beam-epitaxy-grown ZnSe films: Influence of electric field on thermal emission of electrons
- 15 April 1993
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 47 (15) , 9641-9649
- https://doi.org/10.1103/physrevb.47.9641
Abstract
We report a study of the Poole-Frenkel (PF) effect in ZnSe. Our results show that ignoring the PF effect in deep-level transient spectroscopy (DLTS) leads to a significant scatter in the activation-energy data reported in the literature for deep defects in this material. The Ga-doped ZnSe films used in this study were grown on (100) GaAs by molecular-beam epitaxy. Our DLTS results show the presence of two prominent electron traps at depths =0.27 and =0.40–0.48 eV. The trap exhibits a strong PF effect, indicating a donorlike character. Thermal emission from the trap is independent of the electric field. By taking into account the PF effect, we are able to explain the carrier-concentration dependence of the activation energy of trap . The capture process for the trap is thermally activated with a thermal-energy barrier of 0.096 eV. The existence of a thermal barrier for the carrier capture leads to persistent photoconductivity observed below T=90 K. In order to describe the properties of the Ga-related traps in ZnSe:Ga films, we propose a consistent defect model involving complexes of Ga atoms with zinc vacancies in the next-nearest-neighbor positions (-). The model attributes the level to a donorlike state, and the level to an acceptorlike state of - defect complex.
Keywords
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