Temperature/light dependent development of selective resistance to photoinhibition of photosystem I
- 3 July 1998
- journal article
- Published by Wiley in FEBS Letters
- Vol. 430 (3) , 288-292
- https://doi.org/10.1016/s0014-5793(98)00681-4
Abstract
Exposure of winter rye leaves grown at 20°C and an irradiance of either 50 or 250 μmol m−2s−1to high light stress (1600 μmol m−2s−1, 4 h) at 5°C resulted in photoinhibition of PSI measured in vivo as a 34% and 31% decrease in ΔA820/A820(P700+). The same effect was registered in plants grown at 5°C and 50 μmol m−2s−1. This was accompanied by a parallel degradation of the PsaA/PsaB heterodimer, increase of the intersystem e−pool size as well as inhibition of PSII photochemistry measured as Fv/Fm. Surprisingly, plants acclimated to high light (800 μmol m−2s−1) or to 5°C and moderate light (250 μmol m−2s−1) were fully resistant to photoinhibition of PSI and did not exhibit any measurable changes at the level of PSI heterodimer abundance and intersystem e−pool size, although PSII photochemistry was reduced to 66% and 64% respectively. Thus, we show for the first time that PSI, unlike PSII, becomes completely resistant to photoinhibition when plants are acclimated to either 20°C/800 μmol m−2s−1or 5°C/250 μmol m−2s−1as a response to growth at elevated excitation pressure. The role of temperature/light dependent acclimation in the induction of selective tolerance to PSI photoinactivation is discussed.Keywords
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