Dissociative attachment of electrons with Si2H6
- 1 January 1991
- journal article
- Published by Elsevier in International Journal of Mass Spectrometry and Ion Processes
- Vol. 103 (2-3) , 107-115
- https://doi.org/10.1016/0168-1176(91)80082-x
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Dissociative attachment of electrons toOPhysical Review A, 1990
- Ionisation cross sections of rare-gas atoms by electron impactJournal of Physics B: Atomic, Molecular and Optical Physics, 1988
- Theoretical enthalpies of formation of SiHn and SiHn+ (n = 1−4)Chemical Physics Letters, 1988
- Electron impact ionisation of H2O, CO, CO2and CH4Journal of Physics B: Atomic and Molecular Physics, 1987
- Photoionization mass spectrometric studies of SiHn (n=1–4)The Journal of Chemical Physics, 1987
- Theoretical thermochemistry. 1. Heats of formation of neutral AHn molecules (A = Li to Cl)The Journal of Physical Chemistry, 1985
- Positive and negative ions in silane and disilane multipole dischargesInternational Journal of Mass Spectrometry and Ion Processes, 1984
- Kinetics of the gas‐phase reaction between iodine and monosilane and the bond dissociation energy D(H3Si-H)International Journal of Chemical Kinetics, 1981
- Arrhenius parameters for silene insertion reactionsJournal of the Chemical Society, Faraday Transactions 1: Physical Chemistry in Condensed Phases, 1973
- Electron impact study of ionization and dissociation of monosilane and disilaneThe Journal of Physical Chemistry, 1969