High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS
- 1 January 1998
- journal article
- Published by Elsevier in Sensors and Actuators A: Physical
- Vol. 64 (1) , 33-39
- https://doi.org/10.1016/s0924-4247(98)80055-1
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- SU-8: a low-cost negative resist for MEMSJournal of Micromechanics and Microengineering, 1997
- Sub-micron LIGA process for movable microstructuresMicroelectronic Engineering, 1996
- Micromachining applications of a high resolution ultrathick photoresistJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1995
- Der intratubare GametentransferArchiv für Gynäkologie, 1989
- Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding (LIGA process)Microelectronic Engineering, 1986