Reactive deposition of diamond and Si carbide films by hydrogen plasma etching of graphite and Si in the r.f. plasma jet
- 1 February 1993
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 223 (2) , 218-222
- https://doi.org/10.1016/0040-6090(93)90524-s
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
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