High rate jet plasma-assisted chemical vapour deposition
- 1 April 1988
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 158 (2) , 265-270
- https://doi.org/10.1016/0040-6090(88)90029-6
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Properties of Amorphous Silicon Nitride Prepared at High Deposition RateJapanese Journal of Applied Physics, 1985
- New mode of plasma deposition in a capacitively coupled reactorApplied Physics Letters, 1984
- Characterization of Plasma Silicon Nitride LayersJournal of the Electrochemical Society, 1983