Growth kinetics of amorphous and microcrystalline silicon studied by using radical beam
- 1 December 1985
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 77-78, 781-784
- https://doi.org/10.1016/0022-3093(85)90776-8
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- Low-temperature crystallization of doped a-Si:H alloysApplied Physics Letters, 1980
- Mass spectrometry of a silane glow discharge during plasma deposition of a-Si: H filmsThin Solid Films, 1980