Some aspects on an improved stability of a-Si:H and a-Ge:H films with respect to their microstructure
- 1 May 1996
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 198-200, 462-465
- https://doi.org/10.1016/0022-3093(95)00734-2
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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- Interpretation of the saturation behaviour of the metastable defect density created in intrinsic a-Si:H by keV-electron irradiationJournal of Non-Crystalline Solids, 1991