Abstract
A general method is developed for calculating electron diffraction intensities when many simultaneous reflections are considered. The exponential function of a `scattering matrix' is used, and numerical calculations are easily systematized and performed for various thicknesses. The generality and utility of the method is demonstrated by applications to many cases, especially to electron microscope images of imperfect crystals, and the proper procedure for treating absorption is described. Two typical numerical computations are presented in detail, one for five simultaneous reflections and the other for twenty-one, to demonstrate the differences between these and more approximate treatments.

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