Deep Electron Trapping Centers in Si-Doped InAlAs Grown by Molecular Beam Epitaxy
- 16 October 1987
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 103 (2) , 511-516
- https://doi.org/10.1002/pssa.2211030222
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Long-wavelength waveguide multiple-quantum-well (MQW) optical modulator with 30:1 on/off ratioElectronics Letters, 1986
- Deep electron trapping center in Si-doped InGaAlP grown by molecular-beam epitaxyJournal of Applied Physics, 1986
- Metastability and polarization effects in a p n heterojunction device due to deep statesApplied Physics Letters, 1986
- DXcenter: Crossover of deep and shallow states in Si-dopedAsPhysical Review B, 1986
- Direct Evidence for the DX Center Being a Substitutional Donor in AlGaAs Alloy SystemJapanese Journal of Applied Physics, 1985
- InGaAs/InGaAlAs/InAlAs/InP SCH-MQW laser diodes grown by molecular-beam epitaxyElectronics Letters, 1984
- Elimination of Persistent Photoconductivity and Improvement in Si Activation Coefficient by Al Spatial Separation from Ga and Si in Al–Ga–As:Si Solid System –a Novel Short Period AlAs/n-GaAs Superlattice–Japanese Journal of Applied Physics, 1983
- 1.5–1.6-μm Ga0.47In0.53As/Al0.48In0.52As multiquantum well lasers grown by molecular beam epitaxyApplied Physics Letters, 1983
- Depletion mode modulation doped Al0.48In0.52As-Ga0.47In0.53As heterojunction field effect transistorsIEEE Electron Device Letters, 1982
- Trapping characteristics and a donor-complex () model for the persistent-photoconductivity trapping center in Te-dopedPhysical Review B, 1979