Hydrogen content and density of plasma-deposited amorphous silicon-hydrogen
- 1 May 1979
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 50 (5) , 3366-3369
- https://doi.org/10.1063/1.326326
Abstract
The hydrogen concentration and density of amorphous semiconducting films prepared by glow‐discharge decomposition of silane have been measured as a function of depositiontemperature. An inductively coupled as well as a capacitively coupled plasma‐decomposition system was used. For samples prepared by the capacitively coupled system, the hydrogen content decreased from 26 to 8 at.% and the density increased from 1.9 to 2.27 g/cm3 as the substrate temperature was increased from 25 to 450 °C.This publication has 23 references indexed in Scilit:
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