Line-shape analyses ofXVVAuger spectra ofp(1×1)-V3Si(100): Evidence for autoionization emission

Abstract
In the light of recent advances in understanding the Auger process, the local electronic structural origins of selected core-valence-valence (XVV) Auger line shapes are analyzed for a transition-metal silicide prototype, V3Si. We report for clean p(1×1)-V3Si(100) Auger spectra that include the region of the vanadium M2,3VV and M1VV and the SiL2,3VV transitions. We compare the measured line shapes to spectra we generated based on the muffin-tin local density of states (DOS) calculated self-consistently by Klein et al. Good agreement in both the Sipp(L2,3M2,3M2,3) and the Vdd(M2,3M4,5M4,5) peak positions between experiment and calculation verified that the final-state hole-hole repulsion for Si (Upp) and V (Udd) are both ∼0 eV. Also, the SiL2,3VV spectrum resembles that of elemental Si in that the line shape is predominantly a self-fold of the Si3p DOS. However, an unexpected result is that the V spectral region above the M2,3VV threshold possesses a broad (∼30-eV-wide) intense feature that is not amenable to conventional interpretation in terms of the M1VV transition or M2,3VV double-ionization or plasmon-gain satellites. We attribute this observation to the presence of Fano autoionization emission associated with deexcitation of the resonant 3p3d transition. Supporting evidence comes from a comparison of our x-ray- and electron-stimulated Auger spectra, and to the line shape of the 3p loss spectrum. In addition, oxygen-dosing Auger and x-ray photoelectron spectroscopy experiments (0-20 L) (1 langmuir = 1 L = 106 Torr sec) indicate dramatic SiL2,3VV line-shape changes associated with oxidation, similar to that observed previously for Pd4Si. The initial oxidation rate is ∼102 faster than that for elemental Si. We hypothesize that the dissociation of O2 is a...