TiSi2 Thin Films Formed on Crystalline and Amorphous Silicon
- 1 January 1990
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Titanium disilicide formation on heavily doped silicon substratesJournal of Applied Physics, 1987
- High Temperature Process Limitation on TiSi2Journal of the Electrochemical Society, 1986
- Metastable phase formation in titanium-silicon thin filmsJournal of Applied Physics, 1985
- Calorimetric studies of crystallization and relaxation of amorphous Si and Ge prepared by ion implantationJournal of Applied Physics, 1985
- First Phase Nucleation And Growth Of Titanium Disilicide With An iPhasis On The Influence Of OxygenMRS Proceedings, 1985
- Resistivities of Thin Film Transition Metal SilicidesJournal of the Electrochemical Society, 1982