Fabrication techniques for surface-acoustic-wave and thin-film optical devices
- 1 January 1974
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in Proceedings of the IEEE
- Vol. 62 (10) , 1361-1387
- https://doi.org/10.1109/proc.1974.9627
Abstract
The techniques of photolithography, electron lithography, X-ray lithography, ion bombardment etching, and liftoff are reviewed, and their advantages and disadvantages assessed from the point of view of fabricating surface-acoustic-wave and thin-film optical devices.Keywords
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