Thermal and direct etching mechanisms of Si(100) with a hyperthermal chlorine beam
- 1 April 1994
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 75 (7) , 3623-3626
- https://doi.org/10.1063/1.356074
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
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