Influence of substrate on structural properties of TiO2 thin films obtained via MOCVD
- 1 March 1994
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 239 (2) , 186-191
- https://doi.org/10.1016/0040-6090(94)90849-4
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Ultra-high vacuum chemical vapor deposition and in situ characterization of titanium oxide thin filmsJournal of Materials Research, 1991
- Gallium oxide thin films: A new material for high-temperature oxygen sensorsSensors and Actuators B: Chemical, 1991
- Pyrolytic transformation of metal alkoxides to oxides: mechanistic studies. Pyrolysis of homoleptic titanium alkoxidesInorganic Chemistry, 1990
- Rapid formation of TiO2 films by a conventional CVD methodJournal of Materials Science Letters, 1990
- Aspects of photo-electrochemical and surface behaviour of titanium(IV) oxidePublished by Springer Nature ,1988
- Chemical vapor deposition of doped TiO2 thin filmsThin Solid Films, 1987
- Summary Abstract: Chemical vapor deposition of titanium oxidesJournal of Vacuum Science & Technology A, 1986
- Electronic Properties of the Interface between Si and TiO2 Deposited at Very Low TemperaturesJapanese Journal of Applied Physics, 1986
- A simple chemical vapour deposition method for depositing thin TiO2 filmsThin Solid Films, 1983
- Characterization of optical thin filmsApplied Optics, 1979