Plasma Diagnostics in a Hollow Cathode arc Evaporation System During TinX‐Deposition
- 1 January 1990
- journal article
- research article
- Published by Wiley in Contributions to Plasma Physics
- Vol. 30 (5) , 637-648
- https://doi.org/10.1002/ctpp.2150300509
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Plasma Processes in Activated Thin Film DepositionContributions to Plasma Physics, 1988
- Introduction to Plasma Physics and Controlled FusionPublished by Springer Nature ,1984
- Free-molecule Langmuir probe and its use in flow-field studies.AIAA Journal, 1966