CrSi resistive films produced by magnetron-plasmatron sputtering
- 1 October 1982
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 96 (4) , 279-284
- https://doi.org/10.1016/0040-6090(82)90511-9
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Complete thin film system for hybrid circuits sputtered with the plasmatronThin Solid Films, 1981
- High rate sputtering techniquesThin Solid Films, 1981
- Experimental evidence for the influence of thermal expansion of the substrate on the temperature coefficient of resistance of resistive filmsThin Solid Films, 1981
- Reactive D.C. sputtering with the magnetron-plasmatron for tantalum pentoxide and titanium dioxide filmsThin Solid Films, 1979
- Amorphous chromium-silicon: A material for kilo-ohm sheet resistancesThin Solid Films, 1979
- Sputtered Silicon–Chromium Resistive FilmsJournal of Vacuum Science and Technology, 1969