Complete thin film system for hybrid circuits sputtered with the plasmatron
- 11 September 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 83 (2) , 165-172
- https://doi.org/10.1016/0040-6090(81)90662-3
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- The role of plasmatron/magnetron systems in physical vapor deposition techniquesThin Solid Films, 1978
- Material Characterization of Ti-Cu-Ni-Au(TCNA)-A New Low Cost Thin Film Conductor SystemIEEE Transactions on Parts, Hybrids, and Packaging, 1975
- A Versatile Ta2N-W-Au/SiO2/Al/SiO2Thin Film Hybrid Microcircuit Metallization SystemIEEE Transactions on Parts, Hybrids, and Packaging, 1975
- Electrical and structural properties of NiCr thin film resistors reactively sputtered in O2Thin Solid Films, 1974
- Structural and electrical properties of evaporated Cr-Ni films as a function of gas pressureThin Solid Films, 1973