The development of surface shape during sputter‐depth profiling in Auger electron spectroscopy
- 1 June 1980
- journal article
- Published by Wiley in Surface and Interface Analysis
- Vol. 2 (3) , 115-119
- https://doi.org/10.1002/sia.740020307
Abstract
No abstract availableKeywords
This publication has 21 references indexed in Scilit:
- The structure and topographical modification of surfaces during depth profilingThin Solid Films, 1979
- The development of surface topography during depth profiling in auger electron spectroscopySurface Science, 1979
- Depth resolution in sputter profiling: Evidence against the sequential layer sputtering modelThin Solid Films, 1978
- Depth resolution and surface roughness effects in sputter profiling of NiCr multilayer sandwich samples using Auger electron spectroscopyThin Solid Films, 1977
- Analytical modelling of sputter induced surface morphologyRadiation Effects, 1977
- The growth of topography during sputtering of amorphous solidsJournal of Materials Science, 1973
- Prediction of ion-bombarded surface topographies using Frank's kinematic theory of crystal dissolutionJournal of Materials Science, 1973
- Die Analyse monomolekularer FestkörperoberflÄchenschichten mit Hilfe der SekundÄrionenemissionThe European Physical Journal A, 1970
- The equilibrium topography of sputtered amorphous solidsJournal of Materials Science, 1969
- Microtopography of surfaces eroded by ion-bombardmentJournal of Materials Science, 1969