Influence of low-energy bombardment of an RF magnetron sputtering discharge on texture formation and stress in ZnO films
- 1 May 1993
- journal article
- Published by Elsevier in Journal of Nuclear Materials
- Vol. 200 (3) , 375-379
- https://doi.org/10.1016/0022-3115(93)90312-m
Abstract
No abstract availableKeywords
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