Chemical non-uniformity of thin dielectric films produced by ammonolysis of monosilane
- 1 September 1976
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 37 (2) , L39-L42
- https://doi.org/10.1016/0040-6090(76)90169-3
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Silicon Oxynitride Films from the NO-NH[sub 3]-SiH[sub 4] ReactionJournal of the Electrochemical Society, 1973
- Hydrides and Hydroxyls in Thin Silicon Dioxide FilmsJournal of the Electrochemical Society, 1971
- Characterization of Silicon Nitride FilmsJournal of the Electrochemical Society, 1971
- Molecular Structure and Cracks of Films Formed by Gas Phase Reaction of SiH4 and NH3Japanese Journal of Applied Physics, 1968
- Étude par spectroscopie infrarouge de composés organosiliciésJournal de Chimie Physique et de Physico-Chimie Biologique, 1964