Additional Bias Effects on the Formation of Amorphous Hydrogenated Carbon Films by ECR
- 1 July 1990
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 29 (7A) , L1203
- https://doi.org/10.1143/jjap.29.l1203
Abstract
Amorphous carbon films with a significant hardness and low compressive internal stress (below 0.1 GPa) were produced by a low temperature chemical vapor deposition (CVD) process at 200°C utilizing an electron cyclotron resonance (ECR). The deposition rate and microhardness of the films formed on glass were 5 nm ·min-1and 18 GPa, respectively. The additional negative bias up to -200 V was effective to produce hard carbon films above 30 GPa, to increase the deposition rate and to decrease the H/C ratio of carbon films.Keywords
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