New insights on the electronic properties of the trivalent silicon defects at oxidized 〈100〉 silicon surfaces

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Abstract
We perform a deep level transient spectroscopy (DLTS) measurement of the band-gap energy distribution of the trivalent silicon defects (Pb centers) on as-oxidized 〈100〉 silicon wafers. By comparison with the 〈111〉 silicon surface, we isolate the energy distribution of the Pb1 center. Its acceptor level is found at 0.42 ± 0.02 eV from the conduction band while the acceptor level for the 〈100〉 Pb0 center is found at 0.22 ± 0.01 eV, a value smaller than at the 〈111〉 surface (0.33 ± 0.01 eV). We obtain new results about the capture cross sections of the 〈100〉Pb centers by energy-resolved DLTS trap filling experiments. The electron capture cross section of 〈100〉Pb1 is determined for the first time (5×10−16 cm2), while the electron capture cross section for 〈100〉 Pb0 (8×10−15 cm2) is found to be in agreement with earlier results.