Cluster-beam deposition for high-quality thin films
- 1 November 1989
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review A
- Vol. 40 (10) , 6128-6129
- https://doi.org/10.1103/physreva.40.6128
Abstract
Transmission electron microscopy studies have recently shown that low-energy cluster-beam deposition allows the formation of higher-quality films compared with the classical molecular-beam deposition. This work presents preliminary results obtained with antimony deposits.Keywords
This publication has 13 references indexed in Scilit:
- Binding energy and electronic properties in antimony clusters: Comparison with bismuth clustersThe Journal of Chemical Physics, 1989
- Molecular-dynamics simulation of cluster and atom deposition on silicon (111)Physical Review B, 1988
- Velocity slip measurements of bismuth clusters produced by the inert gas condensation techniqueMolecular Physics, 1987
- Formation mechanism of large clusters from vaporized solid materialThe Journal of Physical Chemistry, 1987
- Cluster-beam deposition of thin films: A molecular dynamics simulationJournal of Applied Physics, 1987
- Size determination of silver clusters by time-of-flight mass spectroscopy and electron microscopyThin Solid Films, 1986
- Generation of supported metal clusters of controlled sizeJournal of Molecular Catalysis, 1983
- Crystallization Thickness of Amorphous Sb Film on GeOxFilm Substrate in a Vacuum of 10-5TorrJapanese Journal of Applied Physics, 1980
- Generation of Metal Clusters Containing from 2 to 500 AtomsPhysical Review Letters, 1980
- The Growth and Structure of Thin Metallic FilmsJournal of Applied Physics, 1949