Effects of Rapid Thermal Processing on Thermal Oxides of Silicon
- 1 January 1986
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Limited reaction processing: In-situ metal—oxide—semiconductor capacitorsIEEE Electron Device Letters, 1986
- Rapid thermal processing of thin gate dielectrics. Oxidation of siliconIEEE Electron Device Letters, 1985
- Effects of Material and Processing Parameters on the Dielectric Strength of Thermally Grown SiO[sub 2] FilmsJournal of the Electrochemical Society, 1970