Interface morphology studied by angle-resolved soft-x-ray photoemission: Al islands on GaAs(110)
- 15 May 1983
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 27 (10) , 6561-6563
- https://doi.org/10.1103/physrevb.27.6561
Abstract
We have used angle-resolved core-level photoelectron spectroscopy line-shape and intensity analysis to study the morphology of Al overlayers on GaAs(110). Our results demonstrate that this approach can provide easily interpreted structural information about the early stages of interface formation for systems which do not grow smoothly, layer by layer. We find that when Al is deposited at room temperature, island formation occurs for coverages of tens of angstroms. We also demonstrate that Ga selectively diffuses into the Al islands, while As remains localized at or below the GaAs-Al interface.Keywords
This publication has 12 references indexed in Scilit:
- Initial Adsorption State for Al on GaAs(110) and Its Role in the Schottky Barrier FormationPhysical Review Letters, 1982
- Molecular beam epitaxial growth of single-crystal Al films on GaAs (110)Applied Physics Letters, 1982
- Compact analyzer and goniometer for angle-resolved electron spectroscopyReview of Scientific Instruments, 1982
- Al on GaAs(110) interface: Possibility of adatom cluster formationPhysical Review B, 1981
- Atomic Geometry of GaAs(110)--AlPhysical Review Letters, 1981
- Surface Core-Level Binding-Energy Shifts for GaAs(110) and GaSb(110)Physical Review Letters, 1980
- Chemically Induced Charge Redistribution at Al-GaAs InterfacesPhysical Review Letters, 1979
- Metal–semiconductor surface and interface states on (110) GaAsJournal of Vacuum Science and Technology, 1978
- Attenuation lengths of low-energy electrons in solids derived from the yield of proton-excited Auger electrons: beryllium and aluminumPhysical Review B, 1977
- The application of electron spectroscopy to surface studiesJournal of Vacuum Science and Technology, 1974