Recent advances in application of focused ion beam technology
- 30 April 1993
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 21 (1-4) , 179-185
- https://doi.org/10.1016/0167-9317(93)90051-6
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Gas-assisted focused ion beam etching for microfabrication and inspectionMicroelectronic Engineering, 1990
- Chemical characterization of electronic microstructures with sub-100 nm lateral resolutionMicroelectronic Engineering, 1989
- Focused ion beam secondary ion mass spectrometry: Ion images and end-point detectionJournal of Vacuum Science & Technology B, 1989