Low-Temperature PECVD Polysilicon Crystallization by Rapid Thermal Processing
- 1 January 1998
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- High-performance thin-film transistors in large grain size polysilicon deposited by thermal decomposition of disilaneIEEE Transactions on Electron Devices, 1996
- Polysilicon Thin Film Transistors with Cobalt amd Nickel Silicide Source and Drain ContactsMRS Proceedings, 1996
- THE DESIGN OF OPTIMUM MULTIFACTORIAL EXPERIMENTSBiometrika, 1946