Application of hot-wire chemical vapor-deposited Si:H films in thin film transistors and solar cells
- 28 September 2001
- journal article
- conference paper
- Published by Elsevier in Thin Solid Films
- Vol. 395 (1-2) , 320-329
- https://doi.org/10.1016/s0040-6090(01)01288-3
Abstract
No abstract availableKeywords
This publication has 19 references indexed in Scilit:
- Low substrate temperature deposition of amorphous and microcrystalline silicon films on plastic substrates by hot-wire chemical vapor depositionJournal of Non-Crystalline Solids, 2000
- Crystalline Si thin-film solar cells: a reviewApplied Physics A, 1999
- Profiled Poly-Silicon Films by Hot-Wire Chemical Vapour Deposition for Solar Cells on Cheap Metal SubstrateSolid State Phenomena, 1999
- Electronic and optical properties of hot-wire-deposited microcrystalline siliconJournal of Non-Crystalline Solids, 1998
- Hot-Wire CVD Poly-Silicon Films for Thin Film DevicesMRS Proceedings, 1998
- Thin Film Poly-Si Solar Cell on Glass Substrate Fabricated at Low TemperatureMRS Proceedings, 1998
- Device-quality polycrystalline and amorphous silicon films by hot-wire chemical vapour depositionPhilosophical Magazine Part B, 1997
- On the Way Towards High Efficiency Thin Film Silicon Solar Cells by the “Micromorph” ConceptMRS Proceedings, 1996
- Defect formation during growth of hydrogenated amorphous siliconPhysical Review B, 1993
- Deposition of device quality, low H content amorphous siliconJournal of Applied Physics, 1991