Auger electron spectroscopy in sputtering measurements: Application to low-energy Ar+ sputtering of Ag and Nb
- 1 October 1975
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 46 (10) , 4291-4293
- https://doi.org/10.1063/1.321449
Abstract
The sputtering of Ag and Nb by Ar+ in the energy range from 0.5 to 1.5 keV has been measured. The agreement with extant data, where available, is good. The experimental technique is a new adaptation of certain earlier methods and employs Auger electron spectroscopy of a continuously sputtered area of a thin‐film composite structure, produced by vapor deposition. This new method should permit very low sputter yields (S≲10−3) to be measured in subsequent experiments.This publication has 10 references indexed in Scilit:
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