Electrical optimization of plasma-enhanced chemical vapor deposition chamber cleaning plasmas
Open Access
- 1 January 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 16 (1) , 173-182
- https://doi.org/10.1116/1.589774
Abstract
No abstract availableThis publication has 25 references indexed in Scilit:
- Electron Interactions with CF4Journal of Physical and Chemical Reference Data, 1996
- Optical and mass spectrometric investigations of ions and neutral species inradio-frequency dischargesPhysical Review E, 1996
- Time-resolved power and impedance measurements of pulsed radiofrequency dischargesPlasma Sources Science and Technology, 1995
- Electrical characteristics of argon radio frequency glow discharges in an asymmetric cellIEEE Transactions on Plasma Science, 1995
- The Gaseous Electronics Conference radio-frequency reference cell: A defined parallel-plate radio-frequency system for experimental and theoretical studies of plasma-processing dischargesReview of Scientific Instruments, 1994
- Scaling laws for radio frequency glow discharges for dry etchingJournal of Vacuum Science & Technology A, 1990
- Dynamics of a collisional, capacitive RF sheathIEEE Transactions on Plasma Science, 1989
- Analytical solution for capacitive RF sheathIEEE Transactions on Plasma Science, 1988
- The Plasma Etching of Polysilicon with CF 3Cl / Argon Discharges: I . Parametric Modeling and Impedance AnalysisJournal of the Electrochemical Society, 1986
- Polysilicon Etching in SF 6 RF Discharges: Characteristics and Diagnostic MeasurementsJournal of the Electrochemical Society, 1986