An investigation of oxygen indiffusion during laser cleaning/annealing of silicon by means of the 16O(α, α0)16O resonance scattering
- 1 June 1983
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research
- Vol. 211 (1) , 193-201
- https://doi.org/10.1016/0167-5087(83)90569-0
Abstract
No abstract availableKeywords
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