Eigenschaften epitaxialer siliziumschichten auf spinell vor und nach dem oxidieren
- 31 December 1972
- journal article
- Published by Elsevier in Materials Research Bulletin
- Vol. 7 (12) , 1493-1496
- https://doi.org/10.1016/0025-5408(72)90186-9
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Epitaxiale siliziumschichten auf spinell durch aufdampfen im ultra-hoch vakuumMaterials Research Bulletin, 1971
- The chemical polishing of magnesium aluminate spinel in pyrophosphoric acidMaterials Research Bulletin, 1970
- Epitaxial Films of Silicon on Spinel by Vacuum EvaporationJournal of Applied Physics, 1969
- Effects of Oxidation on Electrical Characteristics of Silicon-on-Sapphire FilmsJournal of Applied Physics, 1969
- Epitaxial Growth and Properties of Silicon on Alumina-Rich Single-Crystal SpinelJournal of the Electrochemical Society, 1969
- Mechanical and electrical properties of epitaxial silicon films on spinelSolid-State Electronics, 1968