Electrochemical and optical studies of silicon dissolution in ammonium fluoride solutions
- 1 April 1992
- journal article
- Published by Elsevier in Electrochimica Acta
- Vol. 37 (5) , 889-896
- https://doi.org/10.1016/0013-4686(92)85040-r
Abstract
No abstract availableKeywords
This publication has 28 references indexed in Scilit:
- A voltammetric study of the anodic dissolution of p-Si in fluoride electrolytesJournal of Electroanalytical Chemistry and Interfacial Electrochemistry, 1991
- Photocurrent multiplication during photodissolution of n-Si in NH4FJournal of Electroanalytical Chemistry and Interfacial Electrochemistry, 1990
- Anodic dissolution of p- and n-type siliconJournal of Electroanalytical Chemistry and Interfacial Electrochemistry, 1990
- Porous Silicon Formation and Electropolishing of Silicon by Anodic Polarization in HF SolutionJournal of the Electrochemical Society, 1989
- Electrolytic Growth and Dissolution of Oxide Layers on Silicon in Aqueous Solutions of FluoridesBerichte der Bunsengesellschaft für physikalische Chemie, 1988
- The electrochemical behaviour of n‐type silicon (111)‐surfaces in fluoride containing aqueous electrolytesBerichte der Bunsengesellschaft für physikalische Chemie, 1987
- Anodic properties of n-Si and n-Ge electrodes in HF solution under illumination and in the darkJournal of Electroanalytical Chemistry and Interfacial Electrochemistry, 1983
- Photoanodic properties of an n-type silicon electrode in aqueous solutions containing fluoridesJournal of Electroanalytical Chemistry and Interfacial Electrochemistry, 1983
- On the Mechanism of Chemically Etching Germanium and SiliconJournal of the Electrochemical Society, 1960
- Electropolishing Silicon in Hydrofluoric Acid SolutionsJournal of the Electrochemical Society, 1958