A voltammetric study of the anodic dissolution of p-Si in fluoride electrolytes
- 1 January 1991
- journal article
- Published by Elsevier in Journal of Electroanalytical Chemistry and Interfacial Electrochemistry
- Vol. 297 (2) , 533-540
- https://doi.org/10.1016/0022-0728(91)80049-v
Abstract
No abstract availableThis publication has 18 references indexed in Scilit:
- Ideal hydrogen termination of the Si (111) surfaceApplied Physics Letters, 1990
- Infrared spectroscopy of Si(111) surfaces after HF treatment: Hydrogen termination and surface morphologyApplied Physics Letters, 1988
- X-ray topographic characterization of porous silicon layersJournal of Crystal Growth, 1984
- Anodic properties of n-Si and n-Ge electrodes in HF solution under illumination and in the darkJournal of Electroanalytical Chemistry and Interfacial Electrochemistry, 1983
- Structure of Porous Silicon Layer and Heat‐Treatment EffectJournal of the Electrochemical Society, 1978
- Formation and Properties of Porous Silicon FilmJournal of the Electrochemical Society, 1977
- Anodic Dissolution of N+ SiliconJournal of the Electrochemical Society, 1971
- Anodic dissolution of silicon in hydrofluoric acid solutionsSurface Science, 1966
- Electropolishing Silicon in Hydrofluoric Acid SolutionsJournal of the Electrochemical Society, 1958
- Electrolytic Shaping of Germanium and SiliconBell System Technical Journal, 1956