Anodic dissolution of silicon in hydrofluoric acid solutions
- 1 March 1966
- journal article
- Published by Elsevier in Surface Science
- Vol. 4 (2) , 109-124
- https://doi.org/10.1016/0039-6028(66)90071-9
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- Investigation of the chemical properties of stain films on silicon by means of infrared spectroscopySurface Science, 1965
- On the Mechanism of Chemically Etching Germanium and SiliconJournal of the Electrochemical Society, 1960
- Formation of Hydride Films on Ti, Zr, Hf, Th Dissolving in Hydrofluoric AcidJournal of the Electrochemical Society, 1959
- Electropolishing Silicon in Hydrofluoric Acid SolutionsJournal of the Electrochemical Society, 1958
- Saturation Currents in Germanium and Silicon ElectrodesJournal of the Electrochemical Society, 1958
- Electrolytic Shaping of Germanium and SiliconBell System Technical Journal, 1956