Reactions of XeF2 chemisorbed on Si(111) 7×7
- 15 June 1985
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 46 (12) , 1187-1189
- https://doi.org/10.1063/1.95699
Abstract
The stable overlayer composition resulting from dissociative chemisorption of XeF2 on the Si(111)7×7 surface has been studied by x-ray photoelectron spectroscopy and thermal desorption spectrometry. Evidence is found for the existence of fluorine covalently bonded in the bulk; no evidence for unreacted interstitial fluorine is found.Keywords
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