Annealing behaviour in vacuum-deposited films of silicon oxide
- 1 December 1968
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 2 (5-6) , 403-411
- https://doi.org/10.1016/0040-6090(68)90054-0
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Self-diffusion in simple oxides (A bibliography)Journal of Materials Science, 1968
- The Structure of Silicon Oxide FilmsPhysica Status Solidi (b), 1967
- Low-pass active filtersRadio and Electronic Engineer, 1967
- Electrical Conductivity in Evaporated Silicon Oxide FilmsJournal of Applied Physics, 1966
- Space Charge and Electrode Polarization in Glass, IIJournal of the American Ceramic Society, 1964
- Dielectric Properties and DC Conductivity of Vacuum-Deposited SiO FilmsJapanese Journal of Applied Physics, 1964
- Vacuum deposition of dielectric films for capacitorsVacuum, 1959
- Outgassing of GlassJournal of Applied Physics, 1955