Estimation of Ion Impact Energies and Electrode Self-Bias Voltage in Capacitive RF Discharges
- 1 January 1987
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Application of the physics of plasma sheaths to the modeling of rf plasma reactorsJournal of Applied Physics, 1986
- Frequency dependence of ion bombardment of grounded surfaces in rf argon glow discharges in a planar systemJournal of Applied Physics, 1985
- Positive-ion bombardment of substrates in rf diode glow discharge sputteringJournal of Applied Physics, 1972
- Application of RF Discharges to SputteringIBM Journal of Research and Development, 1970