The plasma for material processing

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Abstract
A new plasma source is developed by introducing `Buckminsterfullerene', , particles into a low-temperature (about 0.2 eV) potassium plasma column confined by a strong axial magnetic field, which consists of electrons, positive ions and large negative ions. Drastic changes in characteristics of thin films formed by using the plasma are observed in accordance with bias control of fluxes and energies of and ions coming into contact with substrates. It is hoped that this ultra-fine-particle plasma will be useful for producing -based materials with unique functions such as alkali fullerides, endohedral metallofullerenes and polymers.