Photochemical Area-Selective Etching of Si And Sio2 Using Synchrotron Radiation
- 1 January 1989
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Synchrotron radiation stimulated semiconductor processes: Chemical vapor deposition and etchingReview of Scientific Instruments, 1989
- Electronic Structure of Photochemically Etched Silicon SurfacesJapanese Journal of Applied Physics, 1988
- Influence of doping on the etching of Si(111)Physical Review B, 1987
- Synchrotron radiation-excited chemical-vapor deposition and etchingJournal of Vacuum Science & Technology B, 1987
- The reaction of fluorine atoms with siliconJournal of Applied Physics, 1981